A blended top-down/bottom-up hierarchical technique has been delivered to manufacture vastly aligned nanoscale domains' arrays with the aid of the use of the self-assembly of asymmetrical poly (styrene-block-ethylene/butylenesblock- styrene) (SEBS) tirblock copolymers. Silicon substrates of various microstucture that is made by way of AFM that machines strategy are used to template the ball-shaped and high-aspect-ratio cylindrical polymer domains' alignment. The poly domains' regular arrays have been oriented by way of AFM micromachining technique's introduction as a put into effect for dominating triblock copolymers' self-assembly manner regionally by means of the usage of the silicon substrate's topography. This graphoepitaxial methodology is exploitable in interbred hard/soft that is condensed substance structures for a range of applications. Furthermore, pairing bottom-up and top-down methods is a bright, and perhaps basic, bridge between the parallel self-assembly of molecules and the morphological constraint of prevailing technology.
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