Mr. Walter F. Worth Profile

Walter F. Worth

at International SEMATECH Manufacturing Initiative

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Proceedings Article | 20 May 2004 Paper

ESH assessment of advanced lithography materials and processes

Walter Worth, Ram Mallela

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536783

KEYWORDS: Lithography, Extreme ultraviolet lithography, Safety, Extreme ultraviolet, Plasma, Manufacturing, Materials processing, High volume manufacturing, Semiconductors, Industrial chemicals

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The ESH Technology group at International SEMATECH is conducting environment, safety, and health (ESH) assessments in collaboration with the lithography technologists evaluating the performance of an increasing number of new materials and technologies being considered for advanced lithography such as 157nm photresist and extreme ultraviolet (EUV). By performing data searches for 75 critical data types, emissions characterizations, and industrial hygiene (IH) monitoring during the use of the resist candidates, it has been shown that the best performing resist formulations, so far, appear to be free of potential ESH concerns. The ESH assessment of the EUV lithography tool that is being developed for SEMATECH has identified several features of the tool that are of ESH concern: high energy consumption, poor energy conversion efficiency, tool complexity, potential ergonomic and safety interlock issues, use of high powered laser(s), generation of ionizing radiation (soft X-rays), need for adequate shielding, and characterization of the debris formed by the extreme temperature of the plasma. By bringing these ESH challenges to the attention of the technologists and tool designers, it is hoped that the processes and tools can be made more ESH friendly.

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