Mr. Weiliang Lin Profile

Weiliang Lin

at ASML Taiwan Ltd

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Publications (2)

Proceedings Article | 1 December 2022 Paper

A study of patterning 36nm-pitch logic contact holes in a metal oxide resist using a high-reflectance phase-shifting mask that results in image reversal

Shih-En Tseng, Chun-Kuang Chen, Dong-Seok Nam, Will Lin, Anthony Yen

Proceedings Volume 12293, 122930C (2022) https://doi.org/10.1117/12.2642302

KEYWORDS: Photomasks, Semiconducting wafers, Calibration, Data modeling, Line width roughness, Logic, Optical lithography, Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes

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Proceedings Article | 26 May 2022 Presentation + Paper

Computational lithographic study of 0.55 NA EUV single patterning for metal layers for the 2nm logic node and beyond

Weimin Gao, Boer Zhu, Tsann-Bim Chiou, Shih-En Tseng, Will Lin, Chun-Kuang Chen, Joerg Zimmermann, Anthony Yen

Proceedings Volume 12052, 120520G (2022) https://doi.org/10.1117/12.2614225

KEYWORDS: Source mask optimization, Metals, Nanoimprint lithography, Extreme ultraviolet, Photomasks, Logic, Optical lithography, Molybdenum, SRAF, Extreme ultraviolet lithography

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