CONFERENCE PROCEEDINGS
Advanced Search
Tom Kielbaso
Product Manager at Entegris Inc
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 2 April 2010 Paper
Reticle haze control: global update and technology roadmap
Oleg Kishkovich, Tom Kielbaso, David Halbmaier
Proceedings Volume 7638, 763819 (2010) https://doi.org/10.1117/12.848432
KEYWORDS: Reticles, Air contamination, Humidity, Contamination, Particles, Photomasks, Pellicles, Sensors, Ultraviolet radiation, Lithography
Proceedings Article | 23 March 2010 Paper
Particle protection capability of SEMI-compliant EUV-pod carriers
Proceedings Volume 7636, 763625 (2010) https://doi.org/10.1117/12.845957
KEYWORDS: Extreme ultraviolet, Particles, Prototyping, Robotics, Extreme ultraviolet lithography, Photomasks, Reticles, Data storage, Scanners, Semiconducting wafers
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top