Thomas Doerge
at Fraunhofer-IBMT
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 May 2009 Paper
Thomas Doerge, S. Kammer, M. Hanauer, Adam Sossalla, S. Steltenkamp
Proceedings Volume 7365, 73650K (2009) https://doi.org/10.1117/12.821649
KEYWORDS: Electrodes, Tissues, Reactive ion etching, Etching, Semiconducting wafers, Nerve, Silicon, Oxygen, Double sided flex circuits, Standards development

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