Dr. Simon van Gorp Profile

Dr. Simon van Gorp

at ASML Netherlands BV

SPIE Involvement:

Author

Publications (3)

SPIE Journal Paper | 6 December 2024

Next step in Moore’s law: high NA EUV system overview and first imaging and overlay performance

Jan van Schoot, Rob van Ballegoij, Hans Butler, Eelco van Setten, Guido Schiffelers, Wim Bouman, Simon van Gorp, Karl Umstadter, Joerg Zimmermann, Daniel Golde, Jens Timo Neumann, Paul Graeupner

JM3, Vol. 24, Issue 01, 011009, (December 2024) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.011009

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Reticles, Scanners, Mirrors, Sensors, Light sources and illumination, Design, Imaging systems, Extreme ultraviolet lithography

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Proceedings Article | 28 April 2023 Presentation + Paper

Overview of stitching for high NA: imaging and overlay experimental and simulation results

Natalia Davydova, Lieve van Look, Vincent Wiaux, Joost Bekaert, Frank Timmermans, Eelco van Setten, Bram Slachter, Laura Huddleston, Claire van Lare, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Marcel Beckers, Simon van Gorp, Cees Lambregts, Chung-Tien Li, Arthur van de Nes, Koen D'Havé, Tatiana Kovalevich, Diederik de Bruin, Stephen Hsu, Rene Carpaij

Proceedings Volume 12494, 124940Q (2023) https://doi.org/10.1117/12.2658511

KEYWORDS: Photomasks, Optical proximity correction, Reflection, Critical dimension metrology, Tantalum, Reflectivity, Metrology, Semiconducting wafers, Scanners, Reticles

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Proceedings Article | 31 October 2022 Poster

Stitching for High NA: new insights and path forward

Natalia Davydova, Vincent Wiaux, Joost Bekaert, Frank Timmermans, Bram Slachter, Tatiana Kovalevich, Eelco van Setten, Marcel Beckers, Simon van Gorp, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Hoon Ser, Diederik de Bruin, Stephen Hsu, Rene Carpaij

Proceedings Volume PC12292, PC1229210 (2022) https://doi.org/10.1117/12.2653388

KEYWORDS: Tantalum, Image resolution, Source mask optimization, Scanners, Reflectivity, Optical proximity correction, Manufacturing, Extreme ultraviolet lithography, Control systems

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