Mr. Satoshi Usui Profile

Satoshi Usui

at Toshiba Corp

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 15 March 2016 Paper

Mask defect printability in the Self-Aligned Quadruple Patterning (SAQP) process

Ken Furubayashi, Koutarou Sho, Seiro Miyoshi, Shinji Yamaguchi, Kazunori Iida, Satoshi Usui, Tsuyoshi Morisaki, Naoki Sato, Hidefumi Mukai

Proceedings Volume 9780, 97800O (2016) https://doi.org/10.1117/12.2218416

KEYWORDS: Photomasks, Optical lithography, Lithography, Double patterning technology, Scanners, Semiconducting wafers, Reactive ion etching, Metals, Semiconductors, Lenses, Opacity, Etching, Critical dimension metrology, Anisotropic etching, Photoresist materials

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SPIE Journal Paper | 1 July 2009

Hotspot management and its applications in ultralow k1 lithography

Kohji Hashimoto, Satoshi Usui, Shigeki Nojima, Toshiya Kotani, Eiji Yamanaka, Satoshi Tanaka, Soichi Inoue

JM3, Vol. 8, Issue 03, 033007, (July 2009) https://doi.org/10.1117/12.10.1117/1.3213232

KEYWORDS: Tolerancing, Lithography, Photomasks, Semiconducting wafers, Feature extraction, Optical proximity correction, Manufacturing, Scanning electron microscopy, Metals, Etching

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Proceedings Article | 19 March 2008 Paper

Hot spot management with die-to-database wafer inspection system

Kohji Hashimoto, Satoshi Usui, Kenji Yoshida, Ichirota Nagahama, Osamu Nagano, Yasuo Matsuoka, Yuuichiro Yamazaki, Soichi Inoue

Proceedings Volume 6925, 692517 (2008) https://doi.org/10.1117/12.772563

KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Optical lithography, Metals, Optical inspection, Wafer inspection, Lithography, Optical proximity correction, CMOS devices

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Proceedings Article | 20 May 2006 Paper

Hot spot-based judgment methodology for high-end photomask availability for any exposure tools

Satoshi Usui, Shigeru Hasebe, Shigeki Nojima, Kohji Hashimoto

Proceedings Volume 6283, 62832J (2006) https://doi.org/10.1117/12.681793

KEYWORDS: Photomasks, Neodymium, Lithography, Process engineering, Manufacturing, Semiconductor manufacturing, Semiconductors, Optical lithography, Personal protective equipment, Inspection

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Proceedings Article | 13 March 2006 Paper

Hot spot management in ultra-low k₁ lithography

Kohji Hashimoto, Satoshi Usui, Shigeki Nojima, Satoshi Tanaka, Eiji Yamanaka, Soichi Inoue

Proceedings Volume 6156, 61560N (2006) https://doi.org/10.1117/12.656418

KEYWORDS: Tolerancing, Lithography, Semiconducting wafers, Photomasks, Manufacturing, Feature extraction, Optical proximity correction, Metals, Etching, Scanning electron microscopy

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Proceedings Article | 29 June 1998 Paper

Accurate proximity correction method with total-process proximity-based correction factor (TCF)

Kohji Hashimoto, Satoshi Usui, Shigeru Hasebe, Masayuki Murota, Takeo Nakayama, Fumitomo Matsuoka, Soichi Inoue, Sachiko Kobayashi, Kazuko Yamamoto

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310752

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Logic devices, Personal protective equipment, Lithography, Optical proximity correction, Semiconductor manufacturing, Fabrication, Distance measurement

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Showing 5 of 6 publications

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