Dr. Sanjay K. Yedur
Director, Product Management at Picarro Inc
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 26 May 2022 Poster + Paper
Fabin Shakila, Sanjay Yedur, Jeffrey Headrick, Chris Rella, Feng Dong, Craig Haupt
Proceedings Volume 12053, 1205326 (2022) https://doi.org/10.1117/12.2614269
KEYWORDS: Reticles, Scanners, Optical filters, Contamination, Metrology, Lithography, Chemical analysis, Semiconducting wafers, Optical lithography, Statistical analysis

SPIE Journal Paper | 16 October 2014
Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsehpour, Holger Schroder, John Piggot
JM3, Vol. 13, Issue 04, 041406, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041406
KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching

Proceedings Article | 2 April 2014 Paper
Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsepour
Proceedings Volume 9050, 90502T (2014) https://doi.org/10.1117/12.2046639
KEYWORDS: Reactive ion etching, Scatterometry, Critical dimension metrology, Metrology, Magnetism, Manufacturing, Photomasks, Etching, Measurement devices, Semiconducting wafers

Proceedings Article | 2 April 2014 Paper
Shahin Zangooie, Jie Li, Karthik Boinapally, Peter Wilkens, Avraham Ver, Babak Khamsepour, Holger Schroder, John Piggot, Sanjay Yedur, Zhuan Liu, Jiangtao Hu
Proceedings Volume 9050, 90501G (2014) https://doi.org/10.1117/12.2046165
KEYWORDS: Scatterometry, Critical dimension metrology, Line edge roughness, Scatter measurement, Semiconducting wafers, Metrology, Reactive ion etching, Manufacturing, Ellipsometry, Data modeling

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 651856 (2007) https://doi.org/10.1117/12.729246
KEYWORDS: Critical dimension metrology, Photomasks, Cadmium, Scatterometry, Scanning electron microscopy, Semiconducting wafers, Scatter measurement, Lithography, Binary data, Metrology

Showing 5 of 18 publications
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