Ms. Sanjana Das Profile

Sanjana Das

at Univ at Albany

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Publications (1)

Proceedings Article | 17 March 2015 Paper

Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme

Nihar Mohanty, Elliott Franke, Eric Liu, Angelique Raley, Jeffrey Smith, Richard Farrell, Mingmei Wang, Kiyohito Ito, Sanjana Das, Akiteru Ko, Kaushik Kumar, Alok Ranjan, David O'Meara, Kenjiro Nawa, Steven Scheer, Anton DeVillers, Peter Biolsi

Proceedings Volume 9428, 94280G (2015) https://doi.org/10.1117/12.2085016

KEYWORDS: Etching, Optical lithography, Lithography, Plasma etching, Vacuum ultraviolet, Line edge roughness, Plasma, Semiconducting wafers, Line width roughness, Photomasks

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