Ryuichi Asako
at Tokyo Electron Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 29 September 2023 Paper
Go Tsuchiya, Makoto Ogusu, Masaki Ishida, Masahiro Tamura, Keita Sakai, Toshiki Ito, Yuto Ito, Isao Kawata, Hideki Kunugi, Shuhei Tamura, Ryuichi Asako, Keisuke Tanaka, Tomohito Yamaji
Proceedings Volume 12915, 1291506 (2023) https://doi.org/10.1117/12.2684487
KEYWORDS: Nanoimprint lithography, Etching, Line width roughness, Optical lithography, Semiconducting wafers, Critical dimension metrology, Overlay metrology, Printing, Optical alignment, Distortion

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12497, 1249709 (2023) https://doi.org/10.1117/12.2658125
KEYWORDS: Nanoimprint lithography, Etching, Line width roughness, Optical lithography, Semiconducting wafers, Critical dimension metrology, Overlay metrology, Printing, Optical alignment, Distortion

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