The scattering properties of a plasmonic array can be reinforced by placing the array near a planar reflector. Finite-
Difference-Time-Domain (FDTD) simulations have been used to demonstrate the key design challenge of modulating
the electric field that drives the plasmonic scattering, by varying the distance of a single Ag nanodisc from a Ag
reflector. We show that the thickness of the dielectric separation layer plays a critical role in determining the spectral
characteristics and the intensity of the power scattered by a Ag nanodisc near a reflector. A possible application of the
designed structure as a plasmonic light-trap for thin Si solar cells is also experimentally demonstrated. Electron-beam
lithography has been used to fabricate a pseudo-random array of 150nm plasmonic Ag nanodiscs on SiO2 on a Ag reflector substrate. The plasmonic reflector shows a high diffuse reflectance of ~54% in the near-infrared, near-bandgap
600-900nm wavelength region for thin Si solar cells, with a low broadband absorption loss of ~18%. Wavelength-angle
resolved scattering measurements indicate an angular scattering range between 20° to 80° with maximum intensity of the
scattered power in the 20° to 60° angular range.
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