Dr. Robert Watso Profile

Dr. Robert Watso

Design Engineer at ASML US Inc

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Author

Publications (6)

Proceedings Article | 22 March 2010 Paper

Litho and patterning challenges for memory and logic applications at the 22-nm node

Jo Finders, Mircea Dusa, Peter Nikolsky, Youri van Dommelen, Robert Watso, Tom Vandeweyer, Joost Beckaert, Bart Laenens, Lieve Van Look

Proceedings Volume 7640, 76400C (2010) https://doi.org/10.1117/12.848330

KEYWORDS: Metals, Logic, Tolerancing, Optical lithography, Semiconducting wafers, Reticles, Double patterning technology, Photomasks, Critical dimension metrology, Lithography

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Proceedings Article | 1 April 2009 Paper

Correlation of EUV resist performance metrics in micro-exposure and full-field EUV projection tools

Thomas Wallow, Bill Pierson, Hiroyuki Mizuno, Anita Fumar-Pici, Karen Petrillo, Chris Anderson, Patrick Naulleau, Steven Hansen, Yunfei Deng, Koen van Ingen Schenau, Chiew-Seng Koay, Linda Ohara, Sang-In Han, Robert Watso, Lior Huli, Martin Burkhardt, Obert Wood, Joerg Mallmann, Bart Kessels, Robert Routh, Kevin Cummings

Proceedings Volume 7273, 72733T (2009) https://doi.org/10.1117/12.814457

KEYWORDS: Optical proximity correction, Extreme ultraviolet lithography, Extreme ultraviolet, Data modeling, Lithography, Diagnostics, Photoresist processing, Nanoimprint lithography, Diffusion, Reticles

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Proceedings Article | 17 October 2008 Paper

An investigation of EUV lithography defectivity

Kevin Cummings, Thomas Laursen, Bill Pierson, Sang-in Han, Robert Watso, Youri van Dommelen, Brian Lee, Yunfei Deng, Bruno La Fontaine, Thomas Wallow, Uzo Okoroanyanwu, Obert Wood, Anna Tchikoulaeva, Christian Holfeld, Jan Hendrick Peters, Chiew-seng Koay, Karen Petrillo, Tony DiBiase, Sumanth Kini, Hiroyuki Mizuno

Proceedings Volume 7122, 71222G (2008) https://doi.org/10.1117/12.801528

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Inspection, Particles, Scanning electron microscopy, Wafer inspection, Defect inspection, Silicon

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Proceedings Article | 27 March 2007 Paper

Defect testing using an immersion exposure system to apply immediate pre-exposure and post-exposure water soaks

Robert Watso, Thomas Laursen, Bill Pierson, Kevin Cummings

Proceedings Volume 6520, 65204V (2007) https://doi.org/10.1117/12.713210

KEYWORDS: Semiconducting wafers, Bridges, Particles, Molecular bridges, Scanners, Double patterning technology, Imaging systems, Immersion lithography, Printing, Manufacturing

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Proceedings Article | 20 March 2006 Paper

Investigation of immersion related defects using pre- and post-wet experiments

Stefan Brandl, Robert Watso, Bill Pierson, Steve Holmes, Yayi Wei, Karen Petrillo, Kevin Cummings, Frank Goodwin

Proceedings Volume 6154, 61540T (2006) https://doi.org/10.1117/12.656697

KEYWORDS: Semiconducting wafers, Digital watermarking, Photoresist processing, Polymers, Scanners, Coating, Defect inspection, Standards development, Platinum, Bridges

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Proceedings Article | 28 May 2004 Paper

Optical path and image performance monitoring of a full-field 157-nm scanner

Greg Wells, Jan Hermans, Robert Watso, Young-Seog Kang, Robert Morton, Michael Kocsis, Uzodinma Okoroanyanwu, Peter De Bisschop, Nickolay Stepanenko, Kurt Ronse

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537328

KEYWORDS: Scanners, Sensors, Modulation transfer functions, Semiconducting wafers, Lithography, Reticles, Spatial frequencies, Monochromatic aberrations, Organic materials, Control systems

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Showing 5 of 6 publications

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