Rituraj Singh Rathore
at National Institute of Technology Hamirpur
SPIE Involvement:
Author
Publications (2)

SPIE Journal Paper | 19 March 2018
Rituraj Singh Rathore, Ashwani K. Rana
JM3, Vol. 17, Issue 01, 013507, (March 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.1.013507
KEYWORDS: Fin field effect transistors, Line edge roughness, Doping, Optical lithography, Transistors, Computer simulations, Field effect transistors, Line width roughness, CMOS technology, Device simulation

SPIE Journal Paper | 16 February 2017
Rituraj Singh Rathore, Rajneesh Sharma, Ashwani Rana
JM3, Vol. 16, Issue 01, 013503, (February 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.1.013503
KEYWORDS: Field effect transistors, Line edge roughness, Optical lithography, Doping, Metals, Oxides, Tin, Statistical analysis, Calibration

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