Dr. Richard S. Priestley Profile

Dr. Richard S. Priestley

Senior Optical Scientist at Corning Incorporated

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Publications (5)

Proceedings Article | 30 July 2002 Paper

New photomask substrate for improved lithography performance

Bryan Kasprowicz, Richard Priestley, Michael Heslin, David Fladd

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474515

KEYWORDS: Photomasks, Lithography, Birefringence, Semiconducting wafers, Image enhancement, Critical dimension metrology, Refractive index, Silica, Reticles, Refraction

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Proceedings Article | 14 September 2001 Paper

Achieving low-wavefront specifications for DUV lithography: impact of residual stress in HPFS fused silica

Julie Ladison, Joseph Ellison, Douglas Allan, David Fladd, Andrew Fanning, Richard Priestley

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435680

KEYWORDS: Birefringence, Silica, Wavefronts, Wavefront distortions, Refraction, Refractive index, Interferometers, Interferometry, Lithography, Deep ultraviolet

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Proceedings Article | 14 September 2001 Paper

Evaluation of new mask materials for improved lithography performance

Bryan Kasprowicz, Richard Priestley

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435782

KEYWORDS: Photomasks, Birefringence, Semiconducting wafers, Lithography, Refractive index, Manufacturing, Silica, Quartz, Scanners, Optical lithography

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Proceedings Article | 14 September 2001 Paper

Birefringence dispersion in fused silica for DUV lithography

Richard Priestley

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435666

KEYWORDS: Birefringence, Silica, Deep ultraviolet, Lithography, Optical testing, Glasses, Polarization, 193nm lithography, Refractive index, Polarizers

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Proceedings Article | 30 December 1999 Paper

Birefringence dispersion in photomask substrates for DUV lithography

Richard Priestley

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373355

KEYWORDS: Birefringence, Photomasks, Deep ultraviolet, Polarization, Optical testing, Lithography, Silica, Statistical analysis, Polarizers, Optical lithography

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