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Pierce Chang
at Nanya Technology Corp.
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Publications (1)
Proceedings Article | 10 April 2024 Poster + Paper
Single mask solution to pattern DRAM LILP layer at 42nm pitch using EUV CAR photoresist
Arijit Das, Kiho Yang, Toto Chen, Pierce Chang, Sheng-Tse Chen, Shu-De Gong, Hyo Seon Suh, Jeonghoon Lee, Jan-Frederik Finoulst, Chris Wilson, Paulina Rincon Delgadillo, Murat Pak
Proceedings Volume PC12953, PC129530Z (2024) https://doi.org/10.1117/12.3011854
KEYWORDS: Critical dimension metrology, Extreme ultraviolet lithography, Optical lithography, Line width roughness, Photoresist materials, Semiconducting wafers, Finite element methods, Printing, Inspection, Cadmium
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