Mr. Phillip Lim Profile

Phillip Lim

at KLA Corp

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 22 January 2018 Paper

1X HP EUV reticle inspection with a 193nm inspection system

William Broadbent, Sterling Watson, Pei-Chun Chiang, Rui-Fang Shi, Jim-Ren Wang, Phillip Lim

Proceedings Volume 10451, 104510M (2018) https://doi.org/10.1117/12.2281354

KEYWORDS: Inspection, Reticles, Extreme ultraviolet, Defect detection, Semiconducting wafers, Particles, Data modeling, Photomasks, Databases, Extreme ultraviolet lithography

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Proceedings Article | 28 June 2013 Paper

EUV reticle inspection with a 193nm reticle inspector

William Broadbent, Gregg Inderhees, Tetsuya Yamamoto, Isaac Lee, Phillip Lim

Proceedings Volume 8701, 87010W (2013) https://doi.org/10.1117/12.2032553

KEYWORDS: Reticles, Extreme ultraviolet, Inspection, Defect detection, EUV optics, Databases, Data modeling, Semiconducting wafers, Extreme ultraviolet lithography, Particles

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Proceedings Article | 20 March 2010 Paper

Assessing EUV mask defectivity

Uzodinma Okoroanyanwu, Anna Tchikoulaeva, Paul Ackmann, Obert Wood, Bruno La Fontaine, Karsten Bubke, Christian Holfeld, Jan Hendrik Peters, Sumanth Kini, Sterling Watson, Isaac Lee, Bo Mu, Phillip Lim, Sudhar Raghunathan, Carol Boye

Proceedings Volume 7636, 76360J (2010) https://doi.org/10.1117/12.847348

KEYWORDS: Reticles, Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet, Defect detection, Line edge roughness, Scanning electron microscopy, Defect inspection, Optical lithography

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Proceedings Article | 11 May 2009 Paper

TeraScanXR: a high sensitivity and throughput photomask inspection system

Bo Mu, Aditya Dayal, Arosha Goonesekera, Phillip Lim, Chunlin Chen, Po Liu, Kevin Yeung, Becky Pinto, Bill Broadbent, Gregg Inderhees

Proceedings Volume 7379, 73792B (2009) https://doi.org/10.1117/12.824325

KEYWORDS: Inspection, Reticles, Sensors, Databases, Photomasks, Detection and tracking algorithms, SRAF, Logic, Imaging systems, Critical dimension metrology

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Proceedings Article | 24 March 2009 Paper

Results from prototype die-to-database reticle inspection system

Bo Mu, Aditya Dayal, Bill Broadbent, Phillip Lim, Arosha Goonesekera, Chunlin Chen, Kevin Yeung, Becky Pinto

Proceedings Volume 7272, 72723O (2009) https://doi.org/10.1117/12.815574

KEYWORDS: Prototyping, Inspection, Reticles, Sensors, Detection and tracking algorithms, Imaging systems, Logic, SRAF, Signal to noise ratio, Digital breast tomosynthesis

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Proceedings Article | 17 October 2008 Paper

Results from the KLA-Tencor TeraScanXR reticle inspection tool

Aditya Dayal, Bo Mu, Venkat Iyer, Phillip Lim, Arosha Goonesekera, Bill Broadbent

Proceedings Volume 7122, 71223G (2008) https://doi.org/10.1117/12.801831

KEYWORDS: Inspection, Reticles, Line edge roughness, Signal to noise ratio, Sensors, Detection and tracking algorithms, Spatial frequencies, Modulation transfer functions, Image processing, Defect detection

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Proceedings Article | 17 December 2003 Paper

Mask challenges and capability development for the 65-nm device technology node: the first status report

Won Kim, Christopher Aquino, Mark Eickhoff, Phillip Lim, Nobuhiko Fukuhara, Scott Jessen, Yasutaka Kikuchi, Junichi Tanzawa

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518205

KEYWORDS: SRAF, Photomasks, Inspection, Resolution enhancement technologies, Printing, Solids, Lithography, Mask making, Semiconducting wafers, Critical dimension metrology

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Proceedings Article | 16 August 2002 Paper

Multibeam resolution die-to-database reticle inspection

William Volk, William Broadbent, Hector Garcia, Sterling Watson, Phillip Lim, Wayne Ruch

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479351

KEYWORDS: Inspection, Reticles, Image transmission, Databases, Data modeling, Defect detection, Optical proximity correction, Algorithm development, Detection and tracking algorithms, Image processing

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Proceedings Article | 11 March 2002 Paper

Multibeam high-resolution die-to-database reticle inspection

William Volk, William Broadbent, Hector Garcia, Sterling Watson, Phillip Lim, Wayne Ruch

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458271

KEYWORDS: Inspection, Reticles, Image transmission, Databases, Data modeling, Defect detection, Optical proximity correction, Algorithm development, Detection and tracking algorithms, Image storage

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Proceedings Article | 11 March 2002 Paper

Partitioning of photomask processes for defects

Charles Howard, Russell Shoemake, Phillip Lim, Curt Linder

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458318

KEYWORDS: Inspection, Etching, Thulium, Photomasks, Scanning electron microscopy, Calibration, Reflectivity, Defect inspection, Manufacturing, Dry etching

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Showing 5 of 10 publications

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