Phillip Lim
at KLA Corp
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 22 January 2018 Paper
William Broadbent, Sterling Watson, Pei-Chun Chiang, Rui-Fang Shi, Jim-Ren Wang, Phillip Lim
Proceedings Volume 10451, 104510M (2018) https://doi.org/10.1117/12.2281354
KEYWORDS: Inspection, Reticles, Extreme ultraviolet, Defect detection, Semiconducting wafers, Particles, Data modeling, Photomasks, Databases, Extreme ultraviolet lithography

Proceedings Article | 28 June 2013 Paper
Proceedings Volume 8701, 87010W (2013) https://doi.org/10.1117/12.2032553
KEYWORDS: Reticles, Extreme ultraviolet, Inspection, Defect detection, EUV optics, Databases, Data modeling, Semiconducting wafers, Extreme ultraviolet lithography, Particles

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 76360J (2010) https://doi.org/10.1117/12.847348
KEYWORDS: Reticles, Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet, Defect detection, Line edge roughness, Scanning electron microscopy, Defect inspection, Optical lithography

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73792B (2009) https://doi.org/10.1117/12.824325
KEYWORDS: Inspection, Reticles, Sensors, Databases, Photomasks, Detection and tracking algorithms, SRAF, Logic, Imaging systems, Critical dimension metrology

Proceedings Article | 24 March 2009 Paper
Proceedings Volume 7272, 72723O (2009) https://doi.org/10.1117/12.815574
KEYWORDS: Prototyping, Inspection, Reticles, Sensors, Detection and tracking algorithms, Imaging systems, Logic, SRAF, Signal to noise ratio, Digital breast tomosynthesis

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71223G (2008) https://doi.org/10.1117/12.801831
KEYWORDS: Inspection, Reticles, Line edge roughness, Signal to noise ratio, Sensors, Detection and tracking algorithms, Spatial frequencies, Modulation transfer functions, Image processing, Defect detection

Proceedings Article | 17 December 2003 Paper
Won Kim, Christopher Aquino, Mark Eickhoff, Phillip Lim, Nobuhiko Fukuhara, Scott Jessen, Yasutaka Kikuchi, Junichi Tanzawa
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518205
KEYWORDS: SRAF, Photomasks, Inspection, Resolution enhancement technologies, Printing, Solids, Lithography, Mask making, Semiconducting wafers, Critical dimension metrology

Proceedings Article | 16 August 2002 Paper
Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479351
KEYWORDS: Inspection, Reticles, Image transmission, Databases, Data modeling, Defect detection, Optical proximity correction, Algorithm development, Detection and tracking algorithms, Image processing

Proceedings Article | 11 March 2002 Paper
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458271
KEYWORDS: Inspection, Reticles, Image transmission, Databases, Data modeling, Defect detection, Optical proximity correction, Algorithm development, Detection and tracking algorithms, Image storage

Proceedings Article | 11 March 2002 Paper
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458318
KEYWORDS: Inspection, Etching, Thulium, Photomasks, Scanning electron microscopy, Calibration, Reflectivity, Defect inspection, Manufacturing, Dry etching

Showing 5 of 10 publications
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