Dr. Philippe Morey-Chaisemartin Profile

Dr. Philippe Morey-Chaisemartin

CTO at XYALIS

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Publications (11)

SPIE Journal Paper | 2 January 2024

Minimizing die fracture in 3DIC die integration

Jaime Bravo, Philippe Morey-Chaisemartin, Eric Beisser, Frederic Brault, Joshua Zusman, Jimmy Lefevre, Lifu Chang

JM3, Vol. 23, Issue 01, 011003, (January 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011003

KEYWORDS: Semiconducting wafers, Silicon, Electronic design automation, Reliability, Polymers, Image processing, Wafer bonding, Photomasks, Semiconductors, Packaging

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Proceedings Article | 28 April 2023 Presentation + Paper

Minimizing die fracture in three-dimensional IC advanced packaging wafer thinning process by inserting polyimide patterns

Jaime Bravo, Philippe Morey-Chaisemartin, Lifu Chang, Eric Beisser, Frederic Brault, Joshua Zusman

Proceedings Volume 12495, 1249511 (2023) https://doi.org/10.1117/12.2657011

KEYWORDS: Semiconducting wafers, Silicon, Polymers, Advanced packaging, Optical alignment, Electronic design automation, Wafer bonding, Polyimides, Reticles, Reliability

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Proceedings Article | 1 December 2022 Poster + Paper

Single-pass frame generation for multi-layer 3D circuits

Frederic Brault, Philippe Morey, Samuel Boret, Benedicte Bry, Ghislaine Castel, Antonio Marques, Julien Rouessard, Christelle Segur

Proceedings Volume 12293, 122930Q (2022) https://doi.org/10.1117/12.2641690

KEYWORDS: Semiconducting wafers, Sensors, Optical alignment, Imaging systems, Silicon, Process control, Photomasks

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Proceedings Article | 22 February 2021 Presentation + Paper

Reducing stress effects on multi-project-wafer reticles by optimizing metal densities and density gradients in an MPW placement flow

Lifu Chang, Philippe Morey-Chaisemartin, Eric Beisser, Joshua Zusman, Frederic Brault

Proceedings Volume 11614, 116140J (2021) https://doi.org/10.1117/12.2583510

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Proceedings Article | 26 September 2019 Presentation + Paper

Large dies stitching: a technical and cross-functional teams challenge

Philippe Morey-Chaisemartin, Eric Beisser, Frederic Brault, Farid Benzakour

Proceedings Volume 11148, 111481A (2019) https://doi.org/10.1117/12.2536739

KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Databases, Lithography, Silicon, Image processing, Packaging, Consumer electronics

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Proceedings Article | 8 March 2016 Paper

Automatic pattern localization across layout database and photolithography mask

Philippe Morey, Frederic Brault, Eric Beisser, Oliver Ache, Klaus-Dieter Röth

Proceedings Volume 9778, 97783M (2016) https://doi.org/10.1117/12.2229185

KEYWORDS: Photomasks, Databases, Control systems, Optical lithography, Image registration, Metrology, Lithography, Overlay metrology, Image processing, Neodymium

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Proceedings Article | 28 June 2013 Paper

Using a mask rule checker as an electrical rule checker

Philippe Morey-Chaisemartin, Eric Beisser

Proceedings Volume 8701, 87010D (2013) https://doi.org/10.1117/12.2028657

KEYWORDS: Metals, Computer aided design, Transistors, Resistors, Power supplies, Switches, Databases, Electronic design automation, Switching, Algorithm development

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Proceedings Article | 28 June 2013 Paper

Layout finishing of a 28nm, 3 billions transistors, multi-core processor

Philippe Morey-Chaisemartin, Eric Beisser

Proceedings Volume 8701, 87010M (2013) https://doi.org/10.1117/12.2028314

KEYWORDS: Transistors, Analog electronics, Computer aided design, Databases, Metals, Capacitors, Clocks, Mirrors, Silicon, Multilayers

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Proceedings Article | 14 October 2011 Paper

Yield optimization through MLR techniques

Philippe Morey-Chaisemartin, Eric Beisser

Proceedings Volume 8166, 81663H (2011) https://doi.org/10.1117/12.898617

KEYWORDS: Semiconducting wafers, Chemical mechanical planarization, Photomasks, Reticles, Optical proximity correction, Yield improvement, Manufacturing, Instrument modeling, Optical lithography, Lead

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Proceedings Article | 23 September 2009 Paper

A universal mask management relational database

Philippe Morey-Chaisemartin

Proceedings Volume 7488, 748822 (2009) https://doi.org/10.1117/12.828953

KEYWORDS: Photomasks, Databases, Computer aided design, Semiconducting wafers, Inspection, Silicon, Electronic design automation, Manufacturing, Dysprosium, Data processing

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Proceedings Article | 11 May 2009 Paper

European MEDEA+ CRYSTAL project: DFM photomasks inputs for EDA workflow task force

Eric Beisser, Michel Tissier, David Au, Stéphane Bonniol, Patrick Garcia, Philippe Morey-Chaisemartin, Dominique Sadran, Isabelle Servin, Michel Tabusse

Proceedings Volume 7379, 73790W (2009) https://doi.org/10.1117/12.824273

KEYWORDS: Photomasks, Design for manufacturing, Manufacturing, Databases, Computer aided design, Lithography, Design for manufacturability, Inspection, Electronic design automation, Silicon

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Showing 5 of 11 publications

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