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Otto Meijer
Senior Staff R&E Engineer at Synopsys Inc
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Publications (1)
Proceedings Article | 14 October 2011 Paper
Bottlenecks in data preparation flow for multi-beam direct write
Dan Hung, Otto Meijer, Alex Zepka
Proceedings Volume 8166, 81662C (2011) https://doi.org/10.1117/12.896954
KEYWORDS: Data conversion, Raster graphics, Data storage, Photomasks, Semiconducting wafers, Electron beam lithography, Manufacturing, Graphics processing units, Maskless lithography, Lithography
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