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Myoung-Sul Yoo
at Hanyang Univ
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Publications (1)
Proceedings Article | 20 May 2004 Paper
Aerial image characterization for the defects in the extreme ultraviolet mask
Myoung-Sul Yoo, Seung-Wook Park, Jong-Hoi Kim, Yeong-Keun Kwon, Hye-Keun Oh
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534851
KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Extreme ultraviolet, Silicon, Molybdenum, Chromium, Lithography, Optical lithography, Reflectivity
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