Monica Kempsell Sears
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 28 April 2023 Paper
Proceedings Volume 12495, 124950S (2023) https://doi.org/10.1117/12.2660763
KEYWORDS: Optical lithography, Extreme ultraviolet, Optical proximity correction, Design and modelling, SRAF, Semiconducting wafers, Inspection, Source mask optimization, Printing, Electronic design automation

Proceedings Article | 1 December 2022 Poster + Paper
Proceedings Volume 12292, 122920W (2022) https://doi.org/10.1117/12.2645953
KEYWORDS: Photomasks, Optical proximity correction, Stochastic processes, Extreme ultraviolet, Semiconducting wafers, Wafer-level optics, Source mask optimization, Manufacturing, Inspection, Signal to noise ratio, Defect inspection

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