In this contribution, we compare the etching behaviour of fused silica machined with a femtosecond laser at three different wavelengths. We use a high-power YAG laser to generate 450 fs-long pulses at the first (1030 nm) and third (343 nm) harmonic. We demonstrate how these new machining techniques can be used to improve the laser-assisted etching in fused silica not only in terms of etching speed, but also in terms of minimal feature size and surface roughness. Processing speeds of several 100 mm/s become possible due to the new regime using fs-UV light.
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