Mr. Kyeongsu Kim Profile

Kyeongsu Kim

at Fine Semitech Co Ltd

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 14 October 2020 Poster + Presentation + Paper

Study on the multi layers for EUV pellicle

Sang Jin Cho, Kyoungwon Seo, Kyoungsoo Kim, Lan Yu, Seong-yong Moon

Proceedings Volume 11517, 115171E (2020) https://doi.org/10.1117/12.2574586

KEYWORDS: Extreme ultraviolet, Pellicles, Atomic layer deposition, Transmittance, Semiconductors

Read Abstract +

Due to the challenges to meet the transmittance requirements with Si related multi layers for EUV pellicle, many deposition method are tested to evolve the EUV transmittance. For the mass production using EUV lithography, it is expected that high transmittance EUV pellicles will be needed to improve productivity without particle induced yield drop. However, the structure of current EUV pellicle is too thin to handle it. Also, too thin layer cannot protect core layer such as p-Si during the EUV lithography, chemically. Thus, the new layers and materials are needed to achieve high transmittance of EUV and the physical strength. FINE SEMITECH CORP. (“FST”), started to develop new method for EUV pellicle capping layers. First of all, following simulation data were the EUV transmittance trend of SiN layer by according to Si/N ratio. From these simulation data, a simple calculation was formed to predict the EUV transmittance of SiN layer by measuring the atomic ratio. Also, we showed some experimental data of new-SiN layers. A thinner new-SiN layer was adoptable as protective layer with high EUV transmittance for the core layer of EUV pellicle from the results.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years