Mr. Kurt A. Goncher Profile

Kurt A. Goncher

SPIE Involvement:

Author

Publications (2)

Proceedings Article | 20 May 2006 Paper

A study of damage mechanisms during EUV mask substrate cleaning

Abbas Rastegar, Sean Eichenalub, Kurt Goncher, Pat Marmillion

Proceedings Volume 6283, 62830I (2006) https://doi.org/10.1117/12.681841

KEYWORDS: Particles, Extreme ultraviolet, Glasses, Photomasks, Quartz, Atomic force microscopy, Image processing, Chemical mechanical planarization, Surface roughness, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 9 November 2005 Paper

Cleaning of low thermal expansion material substrates for mask blanks in EUV lithography

Sean Eichenlaub, Sebastian Dietze, Yoshiaki Ikuta, Helmut Popp, Kurt Goncher, Pat Marmillion, Abbas Rastegar

Proceedings Volume 5992, 59923K (2005) https://doi.org/10.1117/12.658508

KEYWORDS: Particles, Quartz, Scanning probe microscopy, Defect inspection, Photomasks, Extreme ultraviolet lithography, Inspection, Surface roughness, Silica, Scanning electron microscopy

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years