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Ken Otani
at Canon Inc.
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Publications (1)
Proceedings Article | 26 May 2022 Poster + Paper
Exposure process optimization using machine learning overlay prediction
Masahiro Yoshida, W. H. Wang, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen, Yosuke Takarada, Yoshiki Sakamoto, Shin-ichi Egashira, Ken Otani, Tsukasa Saito, Shoshi Katayama, Seiya Miura, Douglas Shelton
Proceedings Volume 12053, 120531L (2022) https://doi.org/10.1117/12.2611020
KEYWORDS: Data modeling, Semiconducting wafers, Overlay metrology, Machine learning, 3D modeling, Lithography, Data acquisition, Wafer testing, Target detection, Process modeling
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