Mr. Kei Hanai Profile

Kei Hanai

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Proceedings Article | 30 December 2003 Paper

Comparison of micro chrome patterns in gray-scale lithography

Kei Hanai, Yoshinori Matsumoto

Proceedings Volume 5342, (2003) https://doi.org/10.1117/12.525019

KEYWORDS: Photomasks, Lithography, Fresnel lenses, Photography, Electron beam lithography, Raster graphics, Focus stacking software, Ultraviolet radiation, Glasses, Chromium

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Gray scale lithography is an attracting technology to fabricate 3D structures such as a microlens, prism etc. In this study, a gray scale chrome mask was fabricated by using image-processing software and E-beam lithography system that can use bitmap as drawing data. Random dither pattern and half-tone pattern by circles were generated as a fundamental micro pattern. UV exposure was performed on 10μm thick positive resist (AZ-p4620). The mask was distanced 80μm from the resist surface to defocus the micro pattern. As a result, half-tone pattern provides smooth surface while the surface condition of dither pattern had a horizontally large roughness. The resist depth was changed in the range of 20%-80% gray-scale value for the dither pattern, and in the little wider range of 20%-90% for the half-tone pattern. Then, Fresnel lens profile was formed by using half-tone pattern, which profile was calculated by C-code program and polar-coordinates conversion by image-processing software.

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