Mr. Jirka Schatz Profile

Jirka Schatz

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Proceedings Article | 5 October 2023 Paper

Test pattern generation by optimization of the feature space signature

Francois Weisbuch, Jirka Schatz

Proceedings Volume 12802, 1280207 (2023) https://doi.org/10.1117/12.2675601

KEYWORDS: Matrices, Design and modelling, Lithography, Design rules, Feature extraction, Etching, Optical lithography, Optical proximity correction, Evolutionary optimization, Binary data

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Background: Well-designed test patterns are required to ensure a robust patterning involving mask, lithography and etch. They are expected to anticipate potential process challenges while representing well the layout diversity. Problem: We expect good test patterns to have a high design space coverage with minimal redundancy. Is it possible to get optimal design contents while keeping a small footprint and following the design rules? Approach: In this work, after defining specific optical and geometrical features and discretizing the pattern as a binary matrix, we propose to use the signature of the pattern in the feature space to assign a score measuring the usefulness of the pattern. The score is used as a cost function to drive an iterative optimization of the pattern shape based on a differential evolution algorithm. Conclusion: We demonstrated how to generate compact test patterns with high design diversity customized to specific applications that should help to anticipate, represent or monitor well process challenges.

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