Mr. Jerry Cullins Profile

Jerry Cullins

Sr. Member of Technical Staff at HOYA Corp

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 16 March 2007 Paper

EUV exposure experiment using programmed multilayer defects for refining printability simulation

Yoshihiro Tezuka, Jerry Cullins, Yuusuke Tanaka, Takeo Hashimoto, Iwao Nishiyama, Tsutomu Shoki

Proceedings Volume 6517, 65172M (2007) https://doi.org/10.1117/12.711967

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Computer simulations, Transmission electron microscopy, Extreme ultraviolet, Printing, Image processing, Cadmium, Photoresist processing

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Proceedings Article | 15 March 2007 Paper

Impact of interface treatment with assisted ion beam on Mo-Si multilayer formation for EUVL mask blanks

Kenji Hiruma, Yuusuke Tanaka, Shinji Miyagaki, Jerry Cullins, Iwao Nishiyama

Proceedings Volume 6517, 651720 (2007) https://doi.org/10.1117/12.711909

KEYWORDS: Extreme ultraviolet, Interfaces, Surface roughness, Reflectivity, Sputter deposition, Extreme ultraviolet lithography, Ion beams, Atomic force microscopy, Silicon, Photomasks

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Proceedings Article | 15 March 2007 Paper

EUVL mask substrate defect print study

Jerry Cullins, Yoshihiro Tezuka, Iwao Nishiyama, Takeo Hashimoto, Tsutomu Shoki

Proceedings Volume 6517, 65170E (2007) https://doi.org/10.1117/12.714358

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Printing, Bridges, Extreme ultraviolet, Atomic force microscopy, Statistical analysis, Coating, Chromium

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Proceedings Article | 23 March 2006 Paper

Performance and quality analysis of Mo-Si multilayers deposited by ion beam sputtering and magnetron sputtering

Kenji Hiruma, Shinji Miyagaki, Hiromasa Yamanashi, Yuusuke Tanaka, Jerry Cullins, Iwao Nishiyama

Proceedings Volume 6151, 61511V (2006) https://doi.org/10.1117/12.655563

KEYWORDS: Sputter deposition, Silicon, Molybdenum, Extreme ultraviolet, Interfaces, Ion beams, Reflectivity, Chemical species, Transmission electron microscopy, Argon

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Proceedings Article | 23 March 2006 Paper

Impact of multi-layer deposition method on defects for EUVL photomask blanks

Jerry Cullins, Kumi Motai, Iwao Nisiyama

Proceedings Volume 6151, 61511X (2006) https://doi.org/10.1117/12.656931

KEYWORDS: Photomasks, Ion beams, Sputter deposition, Transmission electron microscopy, Deposition processes, Atomic force microscopy, Ions, Extreme ultraviolet lithography, Etching, Manufacturing

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