Dr. Jinseok Heo Profile

Dr. Jinseok Heo

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 10 April 2013 Paper

Advanced overlay stability control with correction per exposure on immersion scanners

Jinkyu Han, Jinseok Heo, Chan Hwang, Jeongho Yeo

Proceedings Volume 8681, 86811D (2013) https://doi.org/10.1117/12.2011379

KEYWORDS: Semiconducting wafers, Overlay metrology, Scanners, Control systems, Process control, Instrument modeling, Lithography, Fourier transforms, Electronics, Semiconductors

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SPIE Journal Paper | 1 October 2011

Highly sensitive and fast scanner focus monitoring method using forbidden pitch pattern

Jinseok Heo, Jeong-Ho Yeo, Young-Hee Kim

JM3, Vol. 10, Issue 04, 043011, (October 2011) https://doi.org/10.1117/12.10.1117/1.3658022

KEYWORDS: Scanners, Semiconducting wafers, Inspection, Calibration, Lithography, Image analysis, Spatial resolution, Scanning electron microscopy, Imaging systems, Overlay metrology

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Proceedings Article | 20 April 2011 Paper

High sensitive and fast scanner focus monitoring method using forbidden pitch pattern

Jinseok Heo, Jeong-Ho Yeo, Younghee Kim

Proceedings Volume 7971, 79711C (2011) https://doi.org/10.1117/12.879802

KEYWORDS: Semiconducting wafers, Scanners, Inspection, Spatial resolution, Calibration, Optical fiber cables, Image resolution, Image enhancement, Scanning electron microscopy, Radon

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Proceedings Article | 24 March 2009 Paper

Sensitivity improvement and noise reduction of array CD mapping on memory device using inspection tool

Jeong-Ho Yeo, Byeong-Ok Cho, Jin-Hong Park, Jinseok Hur, Seok-Hoon Woo, Seungwoon Choi, Chan-Hoon Park

Proceedings Volume 7272, 72721U (2009) https://doi.org/10.1117/12.814024

KEYWORDS: Critical dimension metrology, Polarization, Semiconducting wafers, Inspection, Reflectivity, Silicon, Calibration, Process control, Denoising, Associative arrays

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Proceedings Article | 23 March 2009 Paper

Fast mask CD uniformity measurement using zero order diffraction from memory array pattern

Jinseok Heo, Jinhong Park, Jeongho Yeo, Seongwoon Choi, Woosung Han

Proceedings Volume 7272, 72721S (2009) https://doi.org/10.1117/12.813995

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Critical dimension metrology, Error analysis, Diffraction, Scanners, Printing, Fiber optic illuminators, Charge-coupled devices

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