KEYWORDS: Thin films, Holograms, 3D image reconstruction, Etching, Chemical elements, Chalcogenides, Diffractive optical elements, Electron beams, Electron beam lithography, Holography
A focused electron beam was used to interact with the chalcogenide thin film substrate. The result of the interaction is presented as controlled relief formation on the substrate surface after etching in an alkaline amine solution. By managing focused electron beam parameters, diffractive optical elements and hidden image effect by means of digital hologram have been recorded. As a result, reflected laser beam of the thin film substrate in the near field represents the hidden image that has been recorded along the hologram in the background. The possibilities of practical usage of this substrate as the material for the production of holograms and diffractive optical elements are discussed.
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