Hyun-Jong Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 8 November 2012 Paper
Hyun-Jong Lee, Soo-Han Choi, Jae-Seok Yang, Kwan-Young Chun, Jeong-ho Do, Chul-Hong Park
Proceedings Volume 8522, 85220T (2012) https://doi.org/10.1117/12.964976
KEYWORDS: Optical lithography, Critical dimension metrology, Source mask optimization, Photomasks, Double patterning technology, Resolution enhancement technologies, Lithography, Lithographic illumination, Extreme ultraviolet

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79731L (2011) https://doi.org/10.1117/12.879781
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Data modeling, Lithography, SRAF, Calibration, Nanoimprint lithography, Resolution enhancement technologies

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79731C (2011) https://doi.org/10.1117/12.882814
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Manufacturing, SRAF, Image segmentation, Inverse problems, Optimization (mathematics), Electronics, Electroluminescence

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