CONFERENCE PROCEEDINGS
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Hongyi Liu
at Peking Univ
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Author
Publications (5)
Proceedings Article | 22 March 2016 Paper
A paradigm shift in patterning foundation from frequency multiplication to edge-placement accuracy: a novel processing solution by selective etching and alternating-material self-aligned multiple patterning
Ting Han, Hongyi Liu, Yijian Chen
Proceedings Volume 9777, 977718 (2016) https://doi.org/10.1117/12.2218874
KEYWORDS: Process control, Optical lithography, Etching, Lithography, Probability theory, Photomasks, Failure analysis, Phase only filters, Yield improvement, Critical dimension metrology, Error analysis
Proceedings Article | 16 March 2016 Paper
Structural design, layout analysis and routing strategy for constructing IC standard cells using emerging 3D vertical MOSFETs
Hongyi Liu, Chuyang Hong, Ting Han, Jun Zhou, Yijian Chen
Proceedings Volume 9781, 978103 (2016) https://doi.org/10.1117/12.2219267
KEYWORDS: Field effect transistors, Metals, Optical lithography, Transistors, Structural design, Standards development, Logic, Nanowires, Gallium arsenide, Electrodes
Proceedings Article | 16 March 2016 Paper
Layout decomposition and synthesis for a modular technology to solve the edge-placement challenges by combining selective etching, direct stitching, and alternating-material self-aligned multiple patterning processes
Hongyi Liu, Ting Han, Jun Zhou, Yijian Chen
Proceedings Volume 9781, 97810P (2016) https://doi.org/10.1117/12.2219082
KEYWORDS: Optical lithography, Photomasks, Etching, Manufacturing, Design for manufacturability, Metals, Array processing, Printing, Detection and tracking algorithms, Extreme ultraviolet lithography, Lithography, Algorithm development, Cadmium, Extreme ultraviolet, Chemical mechanical planarization
Proceedings Article | 18 March 2015 Paper
Breaking through 1D layout limitations and regaining 2D design freedom part II: stitching yield modeling and optimization
Jun Zhou, Hongyi Liu, Ting Han, Yijian Chen
Proceedings Volume 9427, 942714 (2015) https://doi.org/10.1117/12.2085898
KEYWORDS: Critical dimension metrology, Optical lithography, Double patterning technology, Yield improvement, Molybdenum, Databases, Data modeling, Optimization (mathematics), Hybrid optics, Performance modeling
Proceedings Article | 18 March 2015 Paper
Breaking through 1D layout limitations and regaining 2D design freedom Part I: 2D layout decomposition and stitching techniques for hybrid optical and self-aligned multiple patterning
Hongyi Liu, Jun Zhou, Yijian Chen
Proceedings Volume 9427, 94270G (2015) https://doi.org/10.1117/12.2085738
KEYWORDS: Optical lithography, Algorithm development, Electron beam lithography, Double patterning technology, Photomasks, Hybrid optics, Detection and tracking algorithms, Etching, Cadmium, Critical dimension metrology
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