Mr. Hisashi Watanabe Profile

Hisashi Watanabe

Senior Engineer at Panasonic Corp

SPIE Involvement:

Author

Proceedings Article | 12 May 2005 Paper

Mask enhancer technology for 45-nm node contact hole fabrication

Takashi Yuito, Vincent Wiaux, Lieve Van Look, Geert Vandenberghe, Shigeo Irie, Takahiro Matsuo, Akio Misaka, Hisashi Watanabe, Masaru Sasago

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598977

KEYWORDS: Thin films, Photomasks, Transmittance, Printing, Lithography, Halftones, Semiconducting wafers, Critical dimension metrology, Quartz, Resolution enhancement technologies

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Proceedings Article | 6 December 2004 Paper

PMJ (Photomask Japan) 2004 panel overview: Issues on mask technology for 65-nm lithography with ArF

Hisashi Watanabe, Hidehiro Watanabe

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.580023

KEYWORDS: Photomasks, Lithography, Manufacturing, Mask making, Electronic design automation, Resolution enhancement technologies, Inspection, Optical proximity correction, Control systems, Metrology

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Proceedings Article | 17 December 2003 Paper

Mask cost and specification

Hisashi Watanabe, Iwao Higashikawa

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.537878

KEYWORDS: Photomasks, Optical proximity correction, Inspection, Lithography, Deep ultraviolet, Manufacturing, Binary data, Semiconducting wafers, Yield improvement, Critical dimension metrology

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Proceedings Article | 26 July 1999 Paper

Comparison of CD variation between organic and inorganic bottom antireflective coating on topographic substrates

Satoko Nakaoka, Hisashi Watanabe, Yoshimitsu Okuda

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354411

KEYWORDS: Critical dimension metrology, Reflection, Reflectivity, Interfaces, Bottom antireflective coatings, Lithography, Control systems, Deep ultraviolet, Photoresist processing, Absorption

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Proceedings Article | 29 June 1998 Paper

Evaluation of coma aberration in projection lens by various measurements

Takashi Saito, Hisashi Watanabe, Yoshimitsu Okuda

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310759

KEYWORDS: Monochromatic aberrations, Image quality, Overlay metrology, Optical testing, Image registration, Critical dimension metrology, Phase shifting, Silicon, Semiconducting wafers, Chromium

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Proceedings Article | 7 July 1997 Paper

Overlay error of fine patterns by lens aberration using modified illumination

Takashi Saito, Hisashi Watanabe, Yoshimitsu Okuda

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275988

KEYWORDS: Overlay metrology, Monochromatic aberrations, Error analysis, Excimer lasers, Optical simulations

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Proceedings Article | 21 May 1996 Paper

Effect of variable sigma aperture on lens distortion and its pattern size dependence

Takashi Saito, Hisashi Watanabe, Yoshimitsu Okuda

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240102

KEYWORDS: Monochromatic aberrations, Distortion, Lithographic illumination, Overlay metrology, Lithography, Optical simulations, Optical lithography, Wavefronts, Calibration, Semiconducting wafers

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Proceedings Article | 7 December 1994 Paper

Design optimization of optical proximity correction mask for device manufacturing

Emiko Sugiura, Hisashi Watanabe, Tadashi Imoriya, Yoshihiro Todokoro

Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195820

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Inspection, Mask making, Reticles, Lithium, Optics manufacturing, Defect detection, Manufacturing

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Proceedings Article | 3 November 1994 Paper

Fabrication and pattern transfer of optical proximity correction (OPC) mask

Emiko Sugiura, Hisashi Watanabe, Tadashi Imoriya, Yoshihiro Todokoro

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191929

KEYWORDS: Photomasks, Optical proximity correction, Inspection, Computer programming, X-ray technology, Reticles, Defect inspection, Defect detection, Mask making, Lithography

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Proceedings Article | 8 August 1993 Paper

Application of phase-shifting mask to DRAM cell capacitor fabrication

Emiko Sugiura, Hisashi Watanabe, Takashi Saito, Tadashi Imoriya, Yoshihiro Todokoro, Morio Inoue

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150490

KEYWORDS: Capacitors, Photomasks, Phase shifts, Semiconducting wafers, Lithography, Capacitance, Mask making, Silicon, Optical lithography, Very large scale integration

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Proceedings Article | 1 July 1991 Paper

Transparent phase-shifting mask with multistage phase shifter and comb-shaped shifter

Hisashi Watanabe, Yoshihiro Todokoro, Yoshihiko Hirai, Morio Inoue

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44832

KEYWORDS: Photomasks, Phase shifting, Phase shifts, Optical lithography, Very large scale integration, Chromium, Polymethylmethacrylate, Semiconducting wafers, Opacity, Polymers

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Showing 5 of 11 publications

Conference Committee Involvement (5)

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XII

13 April 2005 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XI

14 April 2004 | Yokohama, Japan

Photomask and NGL Mask Technology X

16 April 2003 | Yokohama, Japan

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