Mr. Haolin Zhang Profile

Haolin Zhang

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Publications (2)

Proceedings Article | 16 July 2002 Paper

Optimum sampling for characterization of systematic variation in photolithography

Jason Cain, Haolin Zhang, Costas Spanos

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473480

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Data modeling, Optical lithography, Photomasks, Lithography, Integrated circuits, Metrology, Optical proximity correction, Analytical research

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Proceedings Article | 16 July 2002 Paper

Compact formulation of mask error factor for critical dimension control in optical lithography

Haolin Zhang, Jason Cain, Costas Spanos

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473483

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Optical lithography, Error analysis, Optical proximity correction, Process control, Atrial fibrillation, Spatial frequencies, Etching

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