Dr. Gavin L. Williams Profile

Dr. Gavin L. Williams

Research Fellow at Univ of Sheffield

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 10 February 2012 Paper

Applying field mapping refractive beam shapers to improve holographic techniques

Alexander Laskin, Gavin Williams, Richard McWilliam, Vadim Laskin

Proceedings Volume 8281, 82810K (2012) https://doi.org/10.1117/12.903615

KEYWORDS: Beam shaping, Holography, Wavefronts, Collimation, Transmittance, Focus stacking, Laser sources, Computer generated holography, Computer security, Holograms

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Proceedings Article | 16 August 2010 Paper

Applying refractive beam shapers to improve other beam shaping techniques

Alexander Laskin, Gavin Williams, Richard McWilliam, Vadim Laskin

Proceedings Volume 7789, 778907 (2010) https://doi.org/10.1117/12.858646

KEYWORDS: Beam shaping, Computer generated holography, Digital micromirror devices, Spatial light modulators, Collimation, Holography, Lithography, Microscopes, Laser applications, Confocal microscopy

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Proceedings Article | 18 February 2010 Paper

Applying refractive beam shapers in creating spots of uniform intensity and various shapes

Alexander Laskin, Gavin Williams, Alexander Demidovich

Proceedings Volume 7579, 75790N (2010) https://doi.org/10.1117/12.841289

KEYWORDS: Beam shaping, Relays, Collimation, Laser applications, Free electron lasers, Digital micromirror devices, Zoom lenses, Imaging systems, Fiber lasers, Optical components

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Proceedings Article | 1 April 2008 Paper

A photolithographic process for grossly nonplanar substrates

Gavin Williams, Richard McWilliam, Jesus Toriz-Garcia, Richard Curry, Andrew Maiden, N. Luke Seed, Alan Purvis, Peter Ivey

Proceedings Volume 6921, 69212E (2008) https://doi.org/10.1117/12.769148

KEYWORDS: Photomasks, Optical lithography, Computer generated holography, Binary data, Holography, Photoresist materials, Manufacturing, Silicon, Spatial coherence, Lithography

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SPIE Journal Paper | 1 October 2007

Photolithographic patterning of bihelical tracks onto conical substrates

Alan Purvis, Richard McWilliam, Simon Johnson, Nicholas Seed, Gavin Williams, Andrew Maiden, Peter Ivey

JM3, Vol. 6, Issue 04, 043015, (October 2007) https://doi.org/10.1117/12.10.1117/1.2824377

KEYWORDS: Optical lithography, Photomasks, Computer generated holography, Photoresist materials, Binary data, Holography, Manufacturing, Antennas, Lithography, Optical alignment

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