Dr. Fred Stanke Profile

Dr. Fred Stanke

VP, Technology at KLA Tencor Corp

SPIE Involvement:

Author

Publications (2)

Proceedings Article | 24 May 2004 Paper

Metrology exposure-induced resist and ARC damage

Jackie Yu, Anita Viswanathan, Mokoto Miyagi, Junichi Uchida, Lawrence Lane, Kelly Barry, Machi Kajitani, Toshihiko Kikuchi, K. Chan, Fred Stanke

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534373

KEYWORDS: Metrology, Optical filters, Reflectivity, Silicon, Critical dimension metrology, Semiconducting wafers, Process control, Ultraviolet radiation, Photoresist materials, Scatterometry

Read Abstract +

Proceedings Article | 2 June 2003 Paper

Scatterometry-based overlay metrology

Hsu-Ting Huang, Gayathri Raghavendra, Apo Sezginer, Kenneth Johnson, Fred Stanke, Michelle Zimmerman, Cristina Cheung, Makoto Miyagi, Bhanwar Singh

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483668

KEYWORDS: Overlay metrology, Scatterometry, Reticles, Semiconducting wafers, Photomasks, Optical properties, Diffraction gratings, Metals, Scatter measurement, Diffraction

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years