Mr. Eric L. Alemy Profile

Eric L. Alemy

Product Specialist at EMD Electronics

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Author

Publications (3)

Proceedings Article | 24 July 2002 Paper

Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists

Takanori Kudo, Eric Alemy, Ralph Dammel, Woo-Kyu Kim, Sang-Ho Lee, Seiya Masuda, Douglas McKenzie, Dalil Rahman, Andrew Romano, Munirathna Padmanaban, Jun-Sung Chun, Jae Chang Jung, Sung-Koo Lee, Ki-Soo Shin, Hyeong-Soo Kim

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474214

KEYWORDS: Photomasks, Polymers, Lithography, Binary data, Diffusion, Scanning electron microscopy, Halftones, Photoresist processing, Coherence (optics), Monochromatic aberrations

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Proceedings Article | 24 July 2002 Paper

High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

Dalil Rahman, Eric Alemy, Will Conley, Daniel Miller, Ralph Dammel, Woo-Kyu Kim, Takanori Kudo, Sang-Ho Lee, Seiya Masuda, Douglas McKenzie, Munirathna Padmanaban

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474210

KEYWORDS: Polymers, Lithography, Line edge roughness, Photomasks, Semiconducting wafers, Lithographic illumination, Photoresist processing, Binary data, Fourier transforms, Etching

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Proceedings Article | 24 July 2002 Paper

E-beam curing effects on the etch and CD-SEM stability of 193-nm resists

Munirathna Padmanaban, Eric Alemy, Ralph Dammel, Woo-Kyu Kim, Takanori Kudo, Sang-Ho Lee, Douglas McKenzie, Aldo Orsi, Dalil Rahman, Wan-Lin Chen, Reza Sadjadi, William Livesay, Matthew Ross

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474262

KEYWORDS: Etching, Photoresist processing, Scanning electron microscopy, Surface roughness, FT-IR spectroscopy, Electron beams, Semiconducting wafers, Polymers, Chemistry, Oxides

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