Mr. Eiji Kurose Profile

Eiji Kurose

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Publications (5)

Proceedings Article | 20 August 2004 Paper

Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography

Eiji Kurose, Kunio Watanabe, Toshifumi Suganaga, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557753

KEYWORDS: Lithography, Optical lithography, Chromium, Scanning electron microscopy, Transmittance, Photomasks, Nanoimprint lithography, Binary data, Resolution enhancement technologies, Phase shifts

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Proceedings Article | 28 May 2004 Paper

157-nm lithography with extremely high numerical aperture lens for 45-nm technology node

Toshifumi Suganaga, Jeung-Woo Lee, Eiji Kurose, Toshiyuki Ishimaru, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii, Julian Cashmore, Malcolm Gower

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535119

KEYWORDS: Lithography, Phase shifting, Lithographic illumination, Objectives, Photomasks, Nanoimprint lithography, Line edge roughness, Tolerancing, Binary data, Resolution enhancement technologies

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Proceedings Article | 28 August 2003 Paper

Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography

Kunio Watanabe, Eiji Kurose, Toshifumi Suganaga, Toshiro Itani

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504283

KEYWORDS: Lithography, Optical lithography, Electroluminescence, Laser irradiation, Image transmission, Transmittance, Photomasks, Optical simulations, Nanoimprint lithography, Phase shifts

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Proceedings Article | 26 June 2003 Paper

Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens

Kunio Watanabe, Eiji Kurose, Toshifumi Suganaga, Toshiro Itani

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485318

KEYWORDS: Lithography, Image resolution, Electroluminescence, Image transmission, Transmittance, Photomasks, Optical simulations, Binary data, Resolution enhancement technologies, Phase shifts

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Proceedings Article | 26 June 2003 Paper

157-nm lithography for 65-nm node SRAM-gate

Toshifumi Suganaga, Shigeo Irie, Seiro Miyoshi, Jae-Hwan Kim, Kunio Watanabe, Eiji Kurose, Takamitsu Furukawa, Takuya Hagiwara, Toshiyuki Ishimaru, Toshiro Itani

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485376

KEYWORDS: Lithography, Monochromatic aberrations, Silicon, Transmittance, Photomasks, Optical simulations, Optical proximity correction, Reactive ion etching, Photoresist processing, Resolution enhancement technologies

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