Dr. David J. Stein Profile

Dr. David J. Stein

at Sandia National Labs

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 1 September 2006 Paper

High voltage with Si series photovoltaics

David Stein, Robert Nasby, Rupal Patel, Alex Hsia, Reid Bennett

Proceedings Volume 6287, 62870D (2006) https://doi.org/10.1117/12.683769

KEYWORDS: Dielectrics, Solar cells, Semiconducting wafers, Silicon, Photovoltaics, Oxides, Metals, Dielectric breakdown, Sun, Scanning electron microscopy

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Proceedings Article | 23 August 2005 Paper

High voltage series connected Si photovoltaic cells

Rupal Patel, Robert Nasby, David Stein, Alex Hsia, Reid Bennett

Proceedings Volume 5871, 58710F (2005) https://doi.org/10.1117/12.619527

KEYWORDS: Silicon, Solar cells, Semiconducting wafers, Oxides, Etching, Dielectrics, Absorption, Chemical mechanical planarization, Semiconductors, Plasma etching

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Proceedings Article | 17 January 2003 Paper

Micromachined conformal electrode array for retinal prosthesis application

Murat Okandan, Kurt Wessendorf, Todd Christenson, Tom Lemp, Randy Shul, Michael Baker, Conrad James, Ramona Myers, David Stein

Proceedings Volume 4982, (2003) https://doi.org/10.1117/12.478154

KEYWORDS: Electrodes, Retina, Electronics, Antennas, Polymers, Oxides, Etching, Silicon, Semiconducting wafers, Interfaces

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Proceedings Article | 23 April 2001 Paper

Recent advances in endpoint and in-line monitoring techniques for chemical-mechanical polishing processes

David Stein, Dale Hetherington

Proceedings Volume 4406, (2001) https://doi.org/10.1117/12.425261

KEYWORDS: Polishing, Chemical mechanical planarization, Semiconducting wafers, Wafer-level optics, Sensors, Signal processing, Tungsten, Metals, Patents, Oxides

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Proceedings Article | 27 August 1999 Paper

In-line monitoring of chemical-mechanical polishing processes

Dale Hetherington, David Stein

Proceedings Volume 3884, (1999) https://doi.org/10.1117/12.361329

KEYWORDS: Polishing, Chemical mechanical planarization, Semiconducting wafers, Sensors, Wafer-level optics, X-ray optics, Metals, Dielectrics, Patents, Signal processing

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Proceedings Article | 27 April 1999 Paper

Analysis of in-situ vibration monitoring for end-point detection of CMP planarization processes

Dale Hetherington, David Stein, James Lauffer, Edward Wyckoff, David Shingledecker

Proceedings Volume 3743, (1999) https://doi.org/10.1117/12.346902

KEYWORDS: Polishing, Semiconducting wafers, Chemical mechanical planarization, Signal processing, Oxides, Sensors, Metals, Head, Manufacturing, Chlorine

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Proceedings Article | 27 April 1999 Paper

Prediction of tungsten CMP pad life using blanket removal rate data and endpoint data obtained from process temperature and carrier motor current measurements

David Stein, Dale Hetherington

Proceedings Volume 3743, (1999) https://doi.org/10.1117/12.346904

KEYWORDS: Polishing, Semiconducting wafers, Tungsten, Chemical mechanical planarization, Temperature metrology, Metals, Data processing, Failure analysis, Manufacturing, Oxides

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Showing 5 of 7 publications

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