Dr. Daniel A. Freedman Profile

Dr. Daniel A. Freedman

Dean at State Univ of New York at New Paltz

SPIE Involvement:

Author

Publications (12)

SPIE Journal Paper | 19 December 2018

First-row transitional-metal oxalate resists for EUV

Miles Wilklow-Marnell, David Moglia, Benjamin Steimle, Brian Cardineau, Hashim Al-Mashat, Peter Nastasi, Kara Heard, Amber Aslam, Rachel Kaminski, Michael Murphy, Ryan Del Re, Miriam Sortland, Michaela Vockenhuber , Yasin Ekinci, Robert Brainard, Daniel Freedman

JM3, Vol. 17, Issue 04, 043507, (December 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.043507

KEYWORDS: Extreme ultraviolet, Cobalt, Extreme ultraviolet lithography, Chromium, Metals, Photolysis, Solids, Iron, Electrons, Carbon monoxide

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Proceedings Article | 31 March 2017 Presentation + Paper

Advanced development techniques for metal-based EUV resists

Jodi Hotalen, Michael Murphy, William Earley, Michaela Vockenhuber, Yasin Ekinci, Daniel Freedman, Robert Brainard

Proceedings Volume 10143, 1014309 (2017) https://doi.org/10.1117/12.2258126

KEYWORDS: Extreme ultraviolet, Photoresist developing, Cobalt, Platinum, Palladium, Photoresist materials, Imaging systems, Metals, Carbon dioxide, Extreme ultraviolet lithography, Lithography, Light emitting diodes, Photochemistry, Switches, Photons

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Proceedings Article | 27 March 2017 Presentation + Paper

Reactivity of metal-oxalate EUV resists as a function of the central metal

Steven Grzeskowiak, Amrit Narasimhan, Michael Murphy, Lee Napolitano, Daniel Freedman, Robert Brainard, Greg Denbeaux

Proceedings Volume 10146, 1014605 (2017) https://doi.org/10.1117/12.2258151

KEYWORDS: Electrons, Extreme ultraviolet, Metals, Extreme ultraviolet lithography, Photons, Absorption, Photoresist materials, Absorbance, Microelectronics, Carbon monoxide, Carbon dioxide, Iron

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SPIE Journal Paper | 24 December 2015

Platinum and palladium oxalates: positive-tone extreme ultraviolet resists

Miriam Sortland, Jodi Hotalen, Ryan Del Re, James Passarelli, Michael Murphy, Tero Kulmala, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard

JM3, Vol. 14, Issue 04, 043511, (December 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043511

KEYWORDS: Palladium, Platinum, Magnesium, Extreme ultraviolet, Solids, Metals, Lithography, Extreme ultraviolet lithography, Carbon monoxide, Carbonates

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SPIE Journal Paper | 9 November 2015

Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates

Ryan Del Re, James Passarelli, Miriam Sortland, Brian Cardineau, Yasin Ekinci, Elizabeth Buitrago, Mark Neisser, Daniel Freedman, Robert Brainard

JM3, Vol. 14, Issue 04, 043506, (November 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043506

KEYWORDS: Tin, Line edge roughness, Photoresist materials, Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Edge roughness, Crystals, Optical filters

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SPIE Journal Paper | 14 October 2015

Organometallic carboxylate resists for extreme ultraviolet with high sensitivity

James Passarelli, Michael Murphy, Ryan Del Re, Miriam Sortland, Jodi Hotalen, Levi Dousharm, Roberto Fallica, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard

JM3, Vol. 14, Issue 04, 043503, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043503

KEYWORDS: Antimony, Polymers, Molecules, Chromium, Extreme ultraviolet, Polymerization, Lithography, Bromine, Scanning electron microscopy, Metals

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Proceedings Article | 20 March 2015 Paper

High-sensitivity molecular organometallic resist for EUV (MORE)

James Passarelli, Michael Murphy, Ryan Del Re, Miriam Sortland, Levi Dousharm, Michaela Vockenhuber, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard

Proceedings Volume 9425, 94250T (2015) https://doi.org/10.1117/12.2086599

KEYWORDS: Polymers, Molecules, Antimony, Extreme ultraviolet, Lithography, Scanning electron microscopy, Metals, Polymerization, Tin, Bismuth

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Proceedings Article | 19 March 2015 Paper

Low-LER tin carboxylate photoresists using EUV

Ryan Del Re, Miriam Sortland, James Pasarelli, Brian Cardineau, Yasin Ekinci, Michaela Vockenhuber, Mark Neisser, Daniel Freedman, Robert Brainard

Proceedings Volume 9422, 942221 (2015) https://doi.org/10.1117/12.2086597

KEYWORDS: Line edge roughness, Tin, Extreme ultraviolet lithography, Photoresist materials, Lithography, Optical lithography, Extreme ultraviolet, Photons, Semiconducting wafers, Neodymium

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Proceedings Article | 19 March 2015 Paper

Positive-tone EUV resists: complexes of platinum and palladium

Miriam Sortland, Ryan Del Re, James Passarelli, Jodi Hotalen, Michaela Vockenhuber, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard

Proceedings Volume 9422, 942227 (2015) https://doi.org/10.1117/12.2086598

KEYWORDS: Palladium, Extreme ultraviolet, Platinum, Extreme ultraviolet lithography, Lithography, Metals, Carbonates, Absorbance, Photoresist developing, Transition metals

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Proceedings Article | 4 April 2014 Paper

EUV resists comprised of main group organometallic oligomeric materials

James Passarelli, Brian Cardineau, Ryan Del Re, Miriam Sortland, Michaela Vockenhuber, Yasin Ekinci, Chandra Sarma, Mark Neisser, Daniel Freedman, Robert Brainard

Proceedings Volume 9051, 90512A (2014) https://doi.org/10.1117/12.2046537

KEYWORDS: Bismuth, Extreme ultraviolet, Metals, Calibration, Lithography, Chlorine, Post-transition metals, Absorbance, Photons, Photoresist materials

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Proceedings Article | 4 April 2014 Paper

EUV resists based on tin-oxo clusters

Brian Cardineau, Ryan Del Re, Hashim Al-Mashat, Miles Marnell, Michaela Vockenhuber, Yasin Ekinci, Chandra Sarma, Mark Neisser, Daniel Freedman, Robert Brainard

Proceedings Volume 9051, 90511B (2014) https://doi.org/10.1117/12.2046536

KEYWORDS: Tin, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Photoresist materials, Photolysis, Thin films, Semiconducting wafers, Silicon films, Absorbance

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Proceedings Article | 1 April 2009 Paper

Lithographic evaluation and chemical modeling of acid amplifiers used in EUV photoresists

Robert Brainard, Craig Higgins, Seth Kruger, Srividya Revuru, Brian Cardineau, Sarah Gibbons, Dan Freedman, Harun Solak, Wang Yueh, Todd Younkin

Proceedings Volume 7273, 72733Q (2009) https://doi.org/10.1117/12.814308

KEYWORDS: Amplifiers, Line edge roughness, Lithography, Extreme ultraviolet lithography, Molecules, Oxygen, Thermal modeling, Thermodynamics, Photoresist materials, Polymers

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Showing 5 of 12 publications

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