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Dr. Dakota Seal
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Publications (1)
SPIE Journal Paper | 27 June 2024
Curvilinear mask metrology: what is the equivalent critical dimension?
Linyong (Leo) Pang, Dakota Seal, Tom Boettiger, Nagesh Shirali, Grace Dai, Aki Fujimura
JM3, Vol. 23, Issue 02, 021304, (June 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.2.021304
KEYWORDS: Critical dimension metrology, Metrology, Semiconducting wafers, Scanning electron microscopy, Optical proximity correction, Optical alignment, Lithography, SRAF, Photomasks, Contour extraction
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