Diode pumped Nd:YAG lasers are becoming a potentially powerful tool for microelectronics packaging and micro- machining. One of the major advantages of such lasers is high brightness and pulse formatting capability. This offers a tool for controlled materials removal or micro-welding. The recently developed high power diode pumped Nd-YAG laser with Slab geometry opened the door for even higher power density. On the other hand, high brightness poses a challenge for management of laser-induced plasma for process stability and repeatability. In order to develop the fundamental understanding of the role of plasma during the laser micro-machining, one needs to fully characterize the plasma density. Laser absorption spectroscopy is a good tool for that purpose since it measures the events near the ground level where population is high and thus measurements are more accurate. This paper describes the technique and presents the results.
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