Dr. Christoph Dolainsky Profile

Dr. Christoph Dolainsky

Manager/Client Services at PDF Solutions GmbH

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Author

Publications (6)

Proceedings Article | 5 July 2000 Paper

Simulation-based method for sidelobe supression

Christoph Dolainsky, Paul Karakatsanis, Fritz Gans, Rainer Pforr, Joerg Thiele

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388952

KEYWORDS: Photomasks, Lithography, Computer simulations, Printing, Phase shifts, Image transmission, Transmittance, Optical proximity correction, Scanning electron microscopy, Manufacturing

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Proceedings Article | 3 February 2000 Paper

Cluster tool for photomask inspection and qualification at 150-nm design rules and beyond

Kai Peter, Volodymyr Ordynskyy, Christoph Dolainsky, Hans Hartmann, Hans-Juergen Brueck

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377100

KEYWORDS: Photomasks, Inspection, Optical proximity correction, Databases, Semiconducting wafers, Data storage, Image processing, Device simulation, Optical lithography, Phase shifts

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Proceedings Article | 26 July 1999 Paper

Integration of alternating phase-shift mask technology into optical proximity correction

Joerg Thiele, Christoph Friedrich, Christoph Dolainsky, Paul Karakatsanis, Wilhelm Maurer

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354367

KEYWORDS: Optical proximity correction, Chromium, Phase shifts, Photomasks, Critical dimension metrology, Lithography, Binary data, Image segmentation, Computer simulations, Printing

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Proceedings Article | 29 June 1998 Paper

Process proximity correction using an automated software tool

Wilhelm Maurer, Christoph Dolainsky, Joerg Thiele, Christoph Friedrich, Paul Karakatsanis

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310754

KEYWORDS: Process modeling, Data modeling, Optical proximity correction, Photomasks, Software development, Lithography, Mask making, Data processing, Mathematical modeling, Reticles

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Proceedings Article | 7 July 1997 Paper

Application of a simple resist model to fast optical proximity correction

Christoph Dolainsky, Wilhelm Maurer

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275995

KEYWORDS: Optical proximity correction, Photoresist processing, Data modeling, Computer simulations, Etching, Coherence (optics), Data processing, Lithography

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Proceedings Article | 12 February 1997 Paper

Evaluation of resist models for fast optical proximity correction

Christoph Dolainsky, Wilhelm Maurer, Thomas Waas

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301192

KEYWORDS: Optical proximity correction, Photomasks, Lithography, Photoresist processing, Mask making, Manufacturing, Etching, Head, Image processing, Silver

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Showing 5 of 6 publications

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