Dr. Christian Wies
at AIXUV GmbH
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 27 May 2009 Paper
Azadeh Farahzadi, Christian Wies, Rainer Lebert
Proceedings Volume 7470, 74700E (2009) https://doi.org/10.1117/12.835176
KEYWORDS: Reflectivity, Extreme ultraviolet, Photomasks, Reflectometry, High volume manufacturing, Metrology, Quality measurement, Extreme ultraviolet lithography, Particles, Factor analysis

Proceedings Article | 16 April 2008 Paper
H. Blaschke, I. Balasa, L. Koch, K. Starke, D. Ristau, C. Wies, R. Lebert, A. Bayer, F. Barkusky, K. Mann
Proceedings Volume 6922, 692228 (2008) https://doi.org/10.1117/12.772859
KEYWORDS: Extreme ultraviolet, Spectrophotometry, EUV optics, Spectroscopy, Reflectivity, Inspection, Process control, Optical lithography, Geometrical optics, Charge-coupled devices

Proceedings Article | 3 May 2007 Paper
Vivek Bakshi, Rainer Lebert, Bernhard Jägle, Christian Wies, Uwe Stamm, Juergen Kleinschmidt, Guido Schriever, Christian Ziener, Marc Corthout, Joseph Pankert, Klaus Bergmann, Willi Neff, André Egbert, Deborah Gustafson
Proceedings Volume 6533, 653315 (2007) https://doi.org/10.1117/12.737183
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Xenon, Plasma, Tin, Electrodes, Photomasks, Scanners, Lithography, Mirrors

Proceedings Article | 29 August 2006 Paper
Proceedings Volume 6317, 631701 (2006) https://doi.org/10.1117/12.686878
KEYWORDS: Reflectivity, Spectroscopy, Transmittance, Spectrophotometry, CCD cameras, Silicon, Optical components, Spectral resolution, Gold, Calibration

Proceedings Article | 16 June 2005 Paper
Rainer Lebert, Bernhard Jagle, Christian Wies, Uwe Stamm, Juergen Kleinschmidt, Kai Gaebel, Guido Schriever, Joseph Pankert, Klaus Bergmann, Willi Neff, Andre Egbert
Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637333
KEYWORDS: Extreme ultraviolet, Plasma, Extreme ultraviolet lithography, Lithography, Metrology, Xenon, Photomasks, Tin, Reflectivity, Magnetism

Proceedings Article | 16 June 2005 Paper
Christian Wies, Rainer Lebert, Bernhard Jagle, L. Juschkin, F. Sobel, H. Seitz, Ronny Walter, C. Laubis, F. Scholze, W. Biel, O. Steffens
Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637341
KEYWORDS: Mirrors, Reflectivity, Calibration, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Photons, Charge-coupled devices

Proceedings Article | 16 June 2005 Paper
Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Gunter Hess, Konrad Knapp, Christian Wies, Rainer Lebert
Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637335
KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Metrology, Reflectivity, Dry etching, Inspection, Etching, Process control

Proceedings Article | 10 May 2005 Paper
C. Wies, R. Lebert, B. Jaegle, L. Juschkin, F. Sobel, H. Seitz, R. Walter, C. Laubis, F. Scholze, W. Biel, O. Steffens
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599776
KEYWORDS: Mirrors, Reflectivity, Calibration, Reflectometry, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Metrology, Photons, Charge-coupled devices

Proceedings Article | 6 May 2005 Paper
Holger Seitz, Frank Sobel, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Thorsten Reichardt, Ronny Walter, Hans Becker, Ute Buttgereit, Guenter Hess, Konrad Knapp, Christian Wies, Rainer Lebert
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600538
KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Multilayers, Reflectivity, Etching, Dry etching, Metrology, CCD cameras, Inspection

Proceedings Article | 20 May 2004 Paper
Rainer Lebert, Christian Wies, Larissa Juschkin, Bernhard Jaegle, Manfred Meisen, Lutz Aschke, Frank Sobel, Holger Seitz, Frank Scholze, Gerhard Ulm, Konstantin Walter, Willi Neff, Klaus Bergmann, Wolfgang Biel
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537012
KEYWORDS: Reflectometry, Photomasks, Extreme ultraviolet, Mirrors, Spectrographs, Charge-coupled devices, Metrology, Extreme ultraviolet lithography, Photons, Reflectivity

Proceedings Article | 20 May 2004 Paper
Rainer Lebert, Christian Wies, Bernhard Jaegle, Larissa Juschkin, Ulrich Bieberle, Manfred Meisen, Willi Neff, Klaus Bergmann, Konstantin Walter, Oliver Rosier, Max Schuermann, Thomas Missalla
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538058
KEYWORDS: Extreme ultraviolet, Lamps, Extreme ultraviolet lithography, Calibration, Mirrors, Silicon, Reflectometry, Metrology, Neon, Zirconium

Proceedings Article | 20 May 2004 Paper
Thomas Missalla, Max Schuermann, Rainer Lebert, Christian Wies, Larissa Juschkin, Roman Klein, Frank Scholze, Gerhard Ulm, Andre Egbert, Boris Tkachenko, Boris Chichkov
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.556521
KEYWORDS: Calibration, Extreme ultraviolet, Sensors, Diodes, Metrology, Spectrographs, Optical filters, Extreme ultraviolet lithography, Transmittance, Mirrors

Proceedings Article | 17 December 2003 Paper
Frank Sobel, Lutz Aschke, Hans Becker, Markus Renno, Frauke Ruggeberg, Steffen Kirchner, Thomas Leutbecher, Nathalie Olschewski, Mario Schiffler, Kurt Walter, Guenter Hess, Ute Buttgereit, Konrad Knapp, Rainer Lebert, Larissa Juschkin, Christian Wies, Bernhard Jagle
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518061
KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Coating, Reflectivity, Polishing, Reflectometry, Surface finishing, Metrology

Showing 5 of 13 publications
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