Dr. Chien-Cheng Chen Profile

Dr. Chien-Cheng Chen

at Taiwan Semiconductor Manufacturing Co Ltd

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 19 March 2018 Paper

Mask lithographic performance investigation with computational Monte-Carlo method on advanced mask patterning

Chun-Hung Liu, Shih-Ming Chang, Chia-Hua Chang, Wen Lo, Hsin-Wei Wu, Chien-Cheng Chen, Alex Chen, Shuo-Yen Chou, Ru-Gun Liu

Proceedings Volume 10584, 105841E (2018) https://doi.org/10.1117/12.2302685

KEYWORDS: Photomasks, Vestigial sideband modulation, Monte Carlo methods, Model-based design, Beam shaping, Critical dimension metrology, Electron beam lithography, Lithography, Process modeling, Optical lithography

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SPIE Journal Paper | 3 June 2016

Characterization of charging-induced pattern positioning errors in advanced mask making

Chien-Cheng Chen, Yen-Cheng Ho, Shao-Wen Chang, Chia-Jen Chen, Ta-Cheng Lien, Chih-Cheng Lin, Hsin-Chang Lee, Anthony Yen

JM3, Vol. 15, Issue 02, 021409, (June 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021409

KEYWORDS: Photomasks, Image registration, Mask making, Palladium, Monte Carlo methods, Quartz, Model-based design, Scattering, Electron beam lithography, Holmium

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Proceedings Article | 10 May 2016 Paper

Investigation and modeling of CPL mask profiles using OCD

Hsuan-Chen Chen, Ren-Hao Lin, Chien-Cheng Chen, Cheng-Hsuan Huang, Ta-Cheng Lien, Chia-Jen Chen, Gaston Lee, Hsin-Chang Lee, Anthony Yen

Proceedings Volume 9984, 998408 (2016) https://doi.org/10.1117/12.2245332

KEYWORDS: Photomasks, Transmission electron microscopy, Atomic force microscopy, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Lithography, Metrology, Modeling, Phase shifts

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Proceedings Article | 23 October 2015 Paper

Exploring the origin of charging-induced pattern positioning errors in mask making using e-beam lithography

Chien-Cheng Chen, Tzu-Ling Liu, Shao-Wen Chang, Yen-Cheng Ho, Chia-Jen Chen, Chih-Cheng Lin, Ta-Cheng Lien, Hsin-Chang Lee, Anthony Yen

Proceedings Volume 9635, 963508 (2015) https://doi.org/10.1117/12.2200961

KEYWORDS: Image registration, Photomasks, Mask making, Electron beam lithography, Optical lithography, Electrons, Quartz, Pellicles, Scattering, Etching

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