Catherine A. Baker
MaskCAD Manager
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 September 1998 Paper
John Petersen, Robert Socha, Alex Naderi, Catherine Baker, Syed Rizvi, Douglas Van Den Broeke, Nishrin Kachwala, J. Fung Chen, Thomas Laidig, Kurt Wampler, Roger Caldwell, Susumu Takeuchi, Yoshiro Yamada, Takashi Senoh, Martin McCallum
Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328861
KEYWORDS: Etching, Optical proximity correction, Diffraction, Photomasks, Reticles, Phase shifts, Quartz, Anisotropic etching, Lithography, Phase measurement

Proceedings Article | 15 February 1994 Paper
Alan Golob, Greg Mullins, Catherine Baker, C. Edward Franks, Asao Shikata
Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167286
KEYWORDS: Critical dimension metrology, Chemistry, Photomask technology, Process control, Robots, Etching, Reticles, Safety, Optics manufacturing, Control systems

Proceedings Article | 26 March 1993 Paper
C. Edward Franks, Asao Shikata, Catherine Baker
Proceedings Volume 1809, (1993) https://doi.org/10.1117/12.142129
KEYWORDS: Composites, Reticles, Tolerancing, Edge roughness, Photomasks, Particles, Opacity, Data analysis, Electron beams, Photoresist materials

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