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Chao Jen Tsou
Senior Process Engineer at KLA
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Publications (1)
Proceedings Article | 10 April 2024 Poster + Paper
Advanced cross-layer overlay simulation with exposure grid re-calculation
Yueh-Feng Lu, Chao-Jen Tsou, Onur Demirer, Holger Bald, Siegfried Hille, Meng-Syun Li, Martin Freitag, Clemens Utzny, Scott Eitapence, Boris Habets, Cheng-Shuai Li, Kao-Tsai Tsai
Proceedings Volume 12955, 1295524 (2024) https://doi.org/10.1117/12.3009745
KEYWORDS: Optical alignment, Semiconducting wafers, Alignment modeling, Overlay metrology, Optical lithography, Scanners, Systems modeling, Performance modeling, Control systems, Computer simulations
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