CONFERENCE PROCEEDINGS
Advanced Search
Dr. Brian M. Trafas
Vice President Marketing at KLA Corp
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 5 May 2005 Paper
Design and process limited yield at the 65-nm node and beyond
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.605369
KEYWORDS: Design for manufacturing, Critical dimension metrology, Process control, Metrology, Overlay metrology, Single crystal X-ray diffraction, Line width roughness, Data modeling, Immersion lithography, Lithography
Proceedings Article | 7 July 1997 Paper
Advanced inspection for 0.25-um-generation semiconductor manufacturing
Arye Shapiro, Thomas James, Brian Trafas
Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275937
KEYWORDS: Semiconducting wafers, Inspection, Reliability, Silicon, Optical spheres, Wafer inspection, Metals, Manufacturing, Semiconductor manufacturing, Contamination
Proceedings Article | 22 September 1995 Paper
Meeting advanced pattern inspection system requirements for 0.25-um technology and beyond
Proceedings Volume 2635, (1995) https://doi.org/10.1117/12.221460
KEYWORDS: Semiconducting wafers, Prototyping, Inspection, Defect detection, Wafer inspection, Image processing, Reliability, Metals, Optical spheres, Laser systems engineering
Proceedings Article | 18 September 1995 Paper
New laser scanning techniques for wafer inspection
Mehrdad Nikoonahad, Brian Leslie, Stanley Stokowski, Brian Trafas, Keith Wells
Proceedings Volume 2638, (1995) https://doi.org/10.1117/12.221207
KEYWORDS: Semiconducting wafers, Particles, Scattering, Laser scanners, Silicon, Inspection, Light scattering, Dielectric polarization, Wafer inspection, Polarization
Proceedings Article | 22 May 1995 Paper
Extendibility of laser scanning tools for advanced wafer inspection
Brian Trafas, Mehrdad Nikoonahad, Keith Wells, R. Johnson, Stanley Stokowski
Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209199
KEYWORDS: Semiconducting wafers, Laser scanners, Laser systems engineering, Light scattering, Wafer inspection, Wafer-level optics, Inspection, Particles, Signal detection, Scattering
Conference Committee Involvement (4)
Metrology, Inspection, and Process Control for Microlithography XXII
25 February 2008 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXI
26 February 2007 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XX
20 February 2006 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XIX
28 February 2005 | San Jose, California, United States
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top