Bobae Kim
at Hanyang Univ
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72732Z (2009) https://doi.org/10.1117/12.814009
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Photoresist materials, Process control, Lithography, Semiconductors, Etching, Photoresist processing, Chemically amplified resists, Polymers

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