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Dr. Arvind Sundaramurthy
Principal Engineer at Intel Corp
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 13 November 2024 Presentation
Co-optimization of photomask exposure conditions and MPC
Michael Erickson, Mahesh Chandramouli, Alex Johnson, Michael Mroz, Vlad Liubich, Zach Rice, Arvind Sundaramurthy, Kushlendra Mishra, Rachit Sharma, Ingo Bork, Alex Wei, Jörg Mellmann, Jiechang Hou
Proceedings Volume 13216, 132161S (2024) https://doi.org/10.1117/12.3038102
KEYWORDS: Photomasks, Critical dimension metrology, SRAF, Scattering, Printing, Bias correction, Forward error correction, Extreme ultraviolet, Modulation, Etching
Proceedings Article | 10 April 2024 Presentation
Progress in resolving mask making challenges to enable HVM curvilinear patterning
Proceedings Volume PC12956, PC1295608 (2024) https://doi.org/10.1117/12.3014935
KEYWORDS: Mask making, Optical lithography, High volume manufacturing, Semiconductor manufacturing, Scanning electron microscopy, Optical proximity correction, Lithography, Inspection, Extreme ultraviolet, Electronic design automation
Proceedings Article | 22 November 2023 Open Access Presentation
End to end curvilinear for sub-2nm lithography
Proceedings Volume PC12751, PC1275108 (2023) https://doi.org/10.1117/12.2688594
KEYWORDS: Photomasks, Lithography, Critical dimension metrology, Optical proximity correction, Inspection, Ecosystems, Design and modelling, Standards development, Semiconductor manufacturing, Semiconducting wafers
Proceedings Article | 30 April 2023 Presentation
A CD uniformity study comparing MRC-constrained all-angle to Manhattan OPC corrections on EUV
Ryan Pearman, Ragu Venkatesan, Arvind Sundaramurthy, Patrick Straney, Zach Rice, Rusty Conner, Harsha Grunes
Proceedings Volume 12495, 124950F (2023) https://doi.org/10.1117/12.2662761
KEYWORDS: Photomasks, Optical proximity correction, Extreme ultraviolet, Optics manufacturing, High volume manufacturing, Extreme ultraviolet lithography
Proceedings Article | 11 November 2022 Presentation
Enabling process optimization for EUV phase shift masks using AIMS(R) EUV phase metrology
Renzo Capelli, Nathan Wilcox, Sven Krannich, Dinumol Devasia, Grizelda Kersteen, Arvind Sundaramurthy, Chang Ju Choi, Sandro Hoffmann, Zachary Rice, Patrick Straney, Klaus Gwosch, Markus Koch, Tim Helbig
Proceedings Volume PC12293, PC122930K (2022) https://doi.org/10.1117/12.2645004
KEYWORDS: Photomasks, Extreme ultraviolet, Metrology, Phase shifts, Semiconducting wafers, Phase measurement, Standards development, Scanners, Refraction, Product engineering
Conference Committee Involvement (1)
Optical and EUV Nanolithography XXXVIII
24 February 2025 | San Jose, California, United States
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