Ms. Anja Vanleenhove Profile

Anja Vanleenhove

Research Engineer at NXP Semiconductors Belgium NV

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Publications (4)

Proceedings Article | 1 May 2023 Presentation + Paper

Mean free path of electrons in EUV photoresist in the energy range 20 to 450 eV

Roberto Fallica, Nicola Mahne, Thierry Conard, Anja Vanleenhove, Stefano Nannarone

Proceedings Volume 12498, 124980J (2023) https://doi.org/10.1117/12.2658310

KEYWORDS: Electrons, Photoresist materials, Extreme ultraviolet lithography, Photoacid generators, Polymers, Quenching, Copolymers, Optical lithography, Lithography, Extreme ultraviolet

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SPIE Journal Paper | 1 October 2009

Fluorinated polymethacrylates as highly sensitive nonchemically amplified e-beam resists

Jeffrey Strahan, Jacob Adams, Kane Jen, Anja Vanleenhove, Colin Neikirk, Timothy Rochelle, Roel Gronheid, Carlton Willson

JM3, Vol. 8, Issue 04, 043011, (October 2009) https://doi.org/10.1117/12.10.1117/1.3274005

KEYWORDS: Polymers, Extreme ultraviolet, Polymethylmethacrylate, Electron beam lithography, Fluorine, Magnesium, Photomasks, Liquids, Chemistry, Lithography

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Proceedings Article | 1 April 2009 Paper

Fluorinated polymethacrylates as highly sensitive non-chemically amplified e-beam resists

Jeff Strahan, Jacob Adams, Wei-Lun Jen, Anja Vanleenhove, Colin Neikirk, Timothy Rochelle, Roel Gronheid, C. Grant Willson

Proceedings Volume 7273, 72733G (2009) https://doi.org/10.1117/12.813736

KEYWORDS: Optical proximity correction, Extreme ultraviolet, Extreme ultraviolet lithography, Data modeling, Lithography, Diagnostics, Nanoimprint lithography, Photoresist processing, Diffusion, Reticles

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Proceedings Article | 26 March 2007 Paper

A litho-only approach to double patterning

A. Vanleenhove, D. Van Steenwinckel

Proceedings Volume 6520, 65202F (2007) https://doi.org/10.1117/12.713914

KEYWORDS: Double patterning technology, Etching, Thin film coatings, Line edge roughness, Lithography, Photomasks, Optical lithography, Phase shifts, Critical dimension metrology, Photoresist processing

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